Utilization in semiconductor wafers and liquid crystal cleaning equipment.
For cleaning semiconductor wafers! Impurities are separated and removed at the molecular level by reverse osmosis membranes, achieving 90-99% removal!
The pure water manufacturing systems and equipment handled by Top Water Systems can also be used for cleaning purposes. They are suitable for precision cleaning, chemical product manufacturing, beverage ingredients, physical and chemical experiments, surface cleaning before plating and painting, and the removal of foul-smelling components. They are also utilized in cleaning equipment for semiconductor wafers and LCDs. Starting with the "RO pure water system," which separates and removes impurities (organic substances, inorganic substances, bacteria, heavy metals, and chemicals) at a molecular level by 90-99% using RO (reverse osmosis membrane), we also offer "ultrasonic cleaning devices" and "fully automatic soft water systems." 【Related Products】 ■ RO Pure Water System ■ TW Series ■ Ion Exchange Cartridge Pure Water Purifier ■ Ultrasonic Cleaning Device *Our company provides comprehensive support from planning to execution and also offers a rental trial service for demonstration units. *For more details, please refer to the PDF materials or feel free to contact us.
- 企業：トップウォーターシステムズ
- 価格：Other
